Thanks to a novel combinatorial growth process, researchers at Pennsylvania State University (PSU) in the US are the first to have produced wafer-sized thin films of vanadium dioxide (VO2) that have the close to ideal ratio of 1:2 for vanadium and oxygen. The material could be used as an additive to make better optoelectronics devices, transistors and memory selectors……..
http://nanotechweb.org/cws/article/tech/63098
